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Oxide film growth is thought to be an effective way to harness the wide range of physical properties exhibited by transition metal oxides and complex oxides for technological purposes. Epitaxial growth allows the greatest depth of understanding to be gained because of the highly crystalline nature of the films. The most popular epitaxial growth methods are pulsed laser deposition (PLD), molecular beam epitaxy (MBE), magnetron sputtering (MS) and chemical vapor deposition (CVD).